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Sputtering Target for Flat Panel & Solar Energy

Sputtering Target for Flat Panel & Solar Energy

Application:

Using the magnetron sputtering method, tiny molybdenum metal particles can vaporize from the molybdenum target, then deposit of on the glass substrate to form a thin film. Molybdenum coating is an important part of the TFT-LCD screen thin film transistor. Through the Mo coating, the individual image points (pixel) can be instantly controlled, which ensure particularly clear image quality. The molybdenum coating can also be applied to the static contact of CIGS solar cells.

Material Property:

Molybdenum has high melting point, high conductivity, lower specific impedance, good resistance to corrosion and environment friendly. The molybdenum sputtering targets can form a thin film on various types of substrate. The sputtered films are widely used in electronic components and electronic products.



Product Specification:

We can provide the molybdenum target products for the current whole generation production line.

Generation

Target Dimension(mm)

G8.5

2650*210*18

G7

2300*200*16

G6

1950*200*16

G5.5/5

1950*1580*14/1700*1431*14

G4

1200*1130*10

G3

950*860*16


We can provide the molybdenum rotating target for the whole generation line, and the overall target with completion of the binding.